CRESCENDO VENTURE MANAGEMENT, LLC

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Crescendo Venture Management LLC

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December 22, 2013
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Biased pulse DC reactive sputtering of oxide films

A biased pulse DC reactor for sputtering of oxide films is presented. The biased pulse DC reactor couples pulsed DC at a particular frequency to the target through a filter which filters out the effects of a bias power applied to the substrate, protecting ...

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May 26, 2008
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